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Authors: S. Dwivedi, H. D'heer, W. Bogaerts
Title: Maximizing fabrication and thermal tolerances of all-silicon FIR wavelength filtering devices
Format: International Journal
Publication date: 4/2015
Journal/Conference/Book: Photonics Technology Letters
Editor/Publisher: IEEE, 
Volume(Issue): 27(8) p.871-874
DOI: 10.1109/LPT.2015.2398464
Citations: 30 ( - last update: 19/5/2024)
13 (OpenCitations - last update: 19/4/2024)
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We propose a method to make silicon optical finite impulse response (FIR) filters tolerant to fabrication (waveguide geometry) and ambient thermal variations. We experimentally demonstrate a Mach-Zehnder interferometer (MZI) filter with fabrication and thermal tolerance, both separately and together. The fabrication-tolerant device measurements show a 20-fold improved tolerance to systematic waveguide linewidth variations, with a wavelength shift of less than 60 pm/nm linewidth change. The fabrication- and thermal-tolerant device is possible by using orthogonal polarizations in the two arms. The fabricated device shows a shift of less than 65 pm/nm and a thermal drift smaller than 15 pm/K over a wavelength range of 40 nm. Simulations show that this concept can be extended to multi-channel filters.

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