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Authors: S. Selvaraja, Gayle Murdoch, Alexey Milenin , Christie Delvaux, Patrick Ong, S. Pathak, D. Vermeulen, Gunther Sterckx, Gustaf Winroth, Peter Verheyen, Guy Lepage, R. Baets, W. Bogaerts, J. Van Campenhout, Philippe Absil
Title: Advanced 300-mm Waferscale Patterning for Silicon Photonics Devices with Record Low Loss and Phase Errors
Format: International Conference Presentation
Publication date: 7/2012
Journal/Conference/Book: 17th OptoElectronics and Communications Conference (OECC 2012)
Editor/Publisher: IEEE, 
Volume(Issue): p.PDP2-2 p15
Location: Busan, South Korea
Citations: Look up on Google Scholar
Download: Download this Publication (241KB) (241KB)


We report on Si photonics devices fabricated on 300mm SOI substrates using 193-immersion lithography. Record low-loss of 0.7dB/cm with low phase-errors is obtained for 450-nm wide wire waveguides. We also demonstrate sub-wavelength grating fiber couplers with 42% coupling efficiency.

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