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Authors: S. Selvaraja, Erik Sleeckx, Marc Schaekers, W. Bogaerts, D. Van Thourhout, P. Dumon, R. Baets
Title: Low-Loss Amorphous Silicon-On-Insulator Technology for Photonic Integrated Circuitry
Format: International Journal
Publication date: 5/2009
Journal/Conference/Book: Optics Communications
Editor/Publisher: Elsevier B.V, 
Volume(Issue): 282(9) p. 1767-1770
DOI: 10.1016/j.optcom.2009.01.021
Citations: 112 ( - last update: 21/7/2024)
85 (OpenCitations - last update: 3/5/2024)
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We report the fabrication of low-loss amorphous silicon photonic wires deposited by plasma enhanced chemical vapor deposition. Single mode photonic wires were fabricated by 193nm optical lithography and dry etching. Propagation loss measurements show a loss of 3.46dB/cm for photonic wires (480X220nm) and 1.34dB/cm for ridge waveguides.

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