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Authors: W. Bogaerts, P. Dumon, D. Taillaert, V. Wiaux, S. Beckx, B. Luyssaert, J. Van Campenhout, D. Van Thourhout, R. Baets
Title: SOI Nanophotonic Waveguide Structures Fabricated with Deep UV Lithography
Format: International Journal
Publication date: 9/2004
Journal/Conference/Book: Photonics and Nanostructures: Fundamentals and Applications (invited)
Editor/Publisher: Elsevier, 
Volume(Issue): 2(2) p.81-86
DOI: 10.1016/j.photonics.2004.07.002
Citations: 21 ( - last update: 26/5/2024)
10 (OpenCitations - last update: 3/5/2024)
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To reduce the dimensions of photonic integrated circuits, high-contrast wavelength-scale structures are needed. We developed a fabrication process for Silicon-on-insulator nanophotonics, based on standard CMOS processing techniques with deep UV lithography. Measurements using either end-fire incoupling or grating-based fibre couplers show photonic crystal waveguides with moderate propagation losses (7.5 dB/mm) and photonic wires with very low propagation losses (0.24 dB/mm).

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